Materials Research Group, Inc.

12441 W 49th Ave, Ste 3
Wheat Ridge, CO 80033
18 Employees

SBIR Award Summary

Total Number of Awards 15
Total Value of Awards $2.21MM
First Award Date 01/01/91
Most Recent Award Date 11/27/00

Key Personnel

Last Name Name Awards Contact
Eisgruber Dr. Ingrid Eisgruber 4
Wang Li Wang 1
Bhat Pawan K. Bhat 2
Treece Randolph Treece 1 Message
Hollingsworth Dr. Russell Hollingsworth 22 Message

15 Awards Won

Phase 2 SBIR

Agency: Air Force
Topic: AF99-031
Budget: 11/27/00 - 02/27/03

Flexible thin film photovoltaics offer a number of advantages over single crystal technologies for space power. Such advantages include a large number of watts per kilogram and watts per volume, superior radiation resistance, low cost, and good temperature cycle stability. However, thin film photovoltaics on lightweight flexible substrates is ...

Phase 1 SBIR

Agency: National Science Foundation
Topic: 2000
Budget: 01/01/00 - 12/31/00

Phase 1 SBIR

Agency: Air Force
Topic: AF99-031
Budget: 04/30/99 - 04/10/00

Flexible thin film photomoltaics offer a number of advantages over single crystal technologies for space power. Such advantages include a large number of watts per kilogram and watts per volume, superior radiation resistance, low cost and good temperature cycle stability. However, thin film photovoltaics on lightweight flexible substrates is not...

Phase 1 STTR

Institution: Colorado School of Mines

Agency: National Science Foundation
Topic: 1999
Budget: 01/01/99 - 12/31/99
PI: Unavailable

Phase 1 SBIR

Agency: National Science Foundation
Topic: 1998
Budget: 01/01/98 - 12/31/98

Phase 1 SBIR

Agency: Department of Energy
Topic: 1998
Budget: 01/01/98 - 12/31/98

50698-98-I

Phase 1 STTR

Institution: Colorado School of Mines

Agency: Defense Advanced Research Projects Agency
Topic: ST97-006
Budget: 07/21/97 - 07/23/98

Materials Research Group, Inc. in collaboration with the Colorado School of Mines, proposes and investigation of the potential of near field scanning optical microscopy (NSOM) for generating 100 nanometer level patterns in hydrogenated amorphous silicon (a-Si:H) photoresists using optically enhanced oxidation. This research builds on MRS's expe...

Phase 1 SBIR

Agency: Missile Defense Agency
Topic: BMDO97-005
Budget: 01/01/97 - 12/16/97

Phase 1 SBIR

Agency: Missile Defense Agency
Topic: BMDO96-005
Budget: 09/17/96 - 03/17/97
PI: Li Wang

Phase 2 SBIR

Agency: Army
Topic: A94-038
Budget: 03/29/96 - 03/29/98

A complete demonstration of the feasibility of using hydrogenated amorphous silicon (a-Si:H) as a vacuum photoresist for mesa etching HgCdTe epitaxial layers was achieved during Phase I contract. Arrays of 400 nm thick, 50 micron square pixels of a-Si:H were produced on crystalline silicon and HgCdTe substrates with a maximum process temperature...

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