Lumarray, Inc.

15 WARD ST Array
Somerville, MA 02143
http://www.lumarray.com
6 Employees

SBIR Award Summary

Total Number of Awards 11
Total Value of Awards $8.52MM
Active Awards 1 valued at $1000K
First Award Date 01/13/04
Most Recent Award Date 04/10/17

Key Personnel

Last Name Name Awards Contact
Smith Dr. Henry I. Smith 15 Message

11 Awards Won

Phase 2 SBIR Active

Agency: Department of Energy
Topic: 04b
Budget: 04/10/17 - 04/09/19

Company will develop a new instrument for making highly precise and essential components, gratings, for fundamental studies at DOE laboratories housing synchrotrons and free-electron lasers. The improved components will enhance research and aid in a wide variety of basic problems facing the US, from energy to health.

Phase 1 SBIR

Agency: Department of Defense
Topic: DTRA143-008
Budget: 12/08/15 - 07/13/16

LumArray proposes in Phase I to demonstrate that its direct-write maskless-photolithography system, the ZP-150, is capable of performing aligned cuts in 1D-grids suitable for the 45 nm node, in addition to writing patterns of arbitrary geometry as required in custom ASICs and a wide range of other DoD and Aerospace applications. In Phase II LumA...

Phase 2 SBIR

Agency: Department of Energy
Topic: 04B-2014
Budget: 01/01/14 - 12/31/14

In the USA there are 15 synchrotron and free-electron-laser facilities, funded primarily by the Department of Energy (DOE); and 52 similar facilities in other countries. Synchrotrons and free-electron lasers are extremely bright sources of x-ray and vacuum-ultraviolet (VUV) radiation. These intense beams are used to study the binding...

Phase 1 SBIR

Agency: Department of Energy
Topic: 04B-2014
Budget: 01/01/14 - 12/31/14

In the USA there are 15 synchrotron and free-electron-laser facilities, funded primarily by the Department of Energy (DOE); and 52 similar facilities in other countries. Synchrotrons and free-electron lasers are extremely bright sources of x-ray and vacuum-ultraviolet (VUV) radiation. These intense beams are used to study the binding...

Phase 2 STTR

Institution: University of Utah

Agency: Office of the Secretary of Defense
Topic: OSD10-T006
Budget: 09/20/12 - 09/20/14

This Phase II STTR proposal seeks to enhance the throughput and resolution of LumArray s maskless photolithography system, the ZP-150, so that it meets the needs of photonic systems for high-fidelity, long-range spatial-phase coherence, full-wafer coverage, 3D structuring, patterning on non-flat surfaces, and sub-100 nm resolution. The ZP-150 i...

Phase 1 STTR

Institution: University of Utah

Agency: Office of the Secretary of Defense
Topic: OSD10-T006
Budget: 06/15/11 - 01/15/12

LumArray, Inc. is developing, and in 4 months will deliver to NIST, a maskless photolithography system of low cost that will meet the specifications for resolution, placement accuracy, overlay, throughput and multilevel alignment required in photonic devices. In Phase I, complex and dense patterns of arbitrary geometry, of relevance to photonic...

Phase 2 SBIR

Agency: Defense Advanced Research Projects Agency
Topic: N07-035
Budget: 06/22/10 - 06/30/11

LumArray, Inc. proposes under Phase II to further improve its maskless zone-plate-array lithography system, to meet the requirements of manufacturers of custom chips for the DoD. Under Phase I, a prototype alpha tool was developed, the ZP-150ATM. Under Phase II we will develop and demonstrate a beta tool, the ZP-150BTM, which will have features ...

Phase 2 SBIR

Agency: Navy
Topic: N07-035
Budget: 07/22/08 - 07/22/10

LumArray, Inc. proposes under Phase II to further improve its maskless zone-plate-array lithography system, to meet the requirements of manufacturers of custom chips for the DoD. Under Phase I, a prototype alpha tool was developed, the ZP-150ATM. Under Phase II we will develop and demonstrate a beta tool, the ZP-150BTM, which will have feature...

Phase 1 SBIR

Agency: Navy
Topic: N07-035
Budget: 03/15/07 - 05/28/08

The zone-plate-array-lithography (ZPAL) system being commercialized by Lumarray, Inc. (the ZP-150) is proposed as the ideal means of providing quick turn-around on masks for DoD integrated-circuit manufacturing, as well as for maskless direct patterning of wafers. We propose to deliver 10 photomasks, made on the ZP-150, to the University of Mar...

Phase 2 SBIR

Agency: Defense Advanced Research Projects Agency
Topic: SB032-045
Budget: 04/11/05 - 12/17/09

The proposed Phase II program will produce in 1 year a low-cost, flexible, maskless-lithography tool, the Model 150A, capable of patterning arbitrary-geometries at minimum half-pitch features of 150 nm. This tool will meet the unique needs of DOD and ASIC practitioners for custom circuits, as well as the needs of a growing community in nanoscal...

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