Nanonex Corp.

1 Deer Park Drive Suite O
Monmouth Junction, NJ 08852
http://www.nanonex.com
12 Employees

SBIR Award Summary

Total Number of Awards 12
Total Value of Awards $3.03MM
First Award Date 06/28/00
Most Recent Award Date 07/01/11

Key Personnel

Last Name Name Awards Contact
Koecher Mr. Larry Koecher 5 Message
Kong Dr. Linshu Kong 4 Message
Wang Dr. Jian Jim Wang 2 Message
Huang Chong Huang 1
Zhang Wei Zhang 1

12 Awards Won

Phase 1 STTR

Institution: Princeton University

Agency: Office of the Secretary of Defense
Topic: OSD10-T005
Budget: 07/01/11 - 01/01/12

The goal of this proposed work is to explore and develop an innovative patterning method of sub-wavelength structures using roll-to-roll proceesing (patterning, pattern transfer and pattern placement). The proposed solution aims to achieve high throughput, low resolution, and capable of patterning and placing various nanomembranes materials. Fig...

Phase 1 SBIR

Agency: Air Force
Topic: AF103-173
Budget: 01/14/11 - 10/17/11
PI: Wei Zhang

We propose a large area low cost manufacturing process for diffraction gratings with very small line-edge-roughness (LER) and defect-free surface using self-perfection by liquefaction (SPEL) and nanoimprint lithography (NIL). The manufacturing process is capable of producing diffraction gratings covering wavelength ranging from UV to LWIR. The m...

Phase 1 SBIR

Agency: Defense Advanced Research Projects Agency
Topic: SB082-043
Budget: 02/03/09 - 10/08/09

In order to diminish the second corollary of Moores Law (the cost of the manufacturing technology increases geometrically with time), Nanonex proposes the use of templates with gratings that can be manufactured at a low-cost by nanoimprint lithography (NIL). These templates are base wafers prefabricated and awaiting customization and can formed...

Phase 2 SBIR

Agency: Defense Advanced Research Projects Agency
Topic: SB043-045
Budget: 02/09/06 - 04/30/08

The objective of the Phase-II proposal is to, based on the accomplishments of Phase-I, further explore and develop innovative nanoimprint lithography (NIL) mask technologies for sub-45 nm node, including mask structures, mask fabrication methods and mask coatings. In particular, we will further explore the solutions to the problems of line edge...

Phase 1 SBIR

Agency: Defense Advanced Research Projects Agency
Topic: SB043-045
Budget: 12/14/04 - 08/31/05

The objective of the proposal is to explore and develop innovative nanoimprint lithography (NIL) mask technologies including mask structures, mask fabrication methods and mask coatings. These new technologies will significantly improve the quality and lower the cost of NIL masks and NIL processes for sub-45 nm nodes. We will investigate the cre...

Phase 1 SBIR

Agency: Defense Advanced Research Projects Agency
Topic: SB041-030
Budget: 05/18/04 - 01/20/05

The goal of the project is to (a) further develop an innovative in-situ real-time characterization tool for nanoimprint lithography (NIL) processes and (b) in-situ template cleaning using a laser beam. The characterization tool is based on real-time diffractive scatterometry and can measure many important imprint parameters (e.g. imprint depth,...

Phase 2 SBIR

Agency: Defense Advanced Research Projects Agency
Topic: SB012-017
Budget: 12/23/02 - 03/30/05

Nanonex is successfully finishing the SBIR Phase I project and has developed a unique nanoimprint tool, Voyager-I that offers unprecedented fast operation and excellent nanostructure uniformity over a large area. In Phase II, Nanonex will focus on further improvements, production, and commercialization of the Voyager tool.

Phase 2 STTR

Institution: Princeton University

Agency: Defense Advanced Research Projects Agency
Topic: ST001-006
Budget: 07/19/02 - 06/20/04

The objective of the Phase II project is to further develop, complete and commercialize a unique nanoimprint lithography (NIL) machine that was designed and developed in phase I. The key personnel involved in the project are former Post-docs and graduate students of Prof. Chou's group, and are experts in NIL. Nanonex has received the exclusive...

Phase 1 SBIR

Agency: Navy
Topic: N02-055
Budget: 04/02/02 - 09/30/02

The goal of the project is to develop nanoimprint lithography based fabrication processes for low-cost, parallel patterning of magnetic device structures of a size below 50 nm feature size. In particular, nanoimprint lithography (NIL) and reactive ion etching (RIE) of nanoscale rectangles and hollow cylinders in insulators will be studied. A ...

Phase 1 SBIR

Agency: Defense Advanced Research Projects Agency
Topic: SB012-017
Budget: 10/31/01 - 06/30/02

Based on the previous extensive work on NIL in Prof. Chou's group and at Nanonex Corporation, the objective of the project is to further develop a promising innovative nanoimprint lithography (NIL) machine design. The design, using a new principle, offers not only excellent uniformity of nanostructures over large areas, high-throughput (

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