systeMech

2401 Crest Line Dr. Array
Madison, WI 53704
1 Employee

SBIR Award Summary

Total Number of Awards 4
Total Value of Awards $1.42MM
Active Awards 1 valued at $707K
First Award Date 08/01/11
Most Recent Award Date 09/15/17

Key Personnel

Last Name Name Awards Contact
Grierson David S Grierson 7 Message

4 Awards Won

Phase 2 STTR Active

Institution: University of Wisconsin, Madison

Agency: National Science Foundation
Topic: MN
Budget: 09/15/17 - 08/31/19

This Small Business Innovation Research (SBIR) Phase II project will advance a novel probe-based direct transfer (PBDT) printing technology for manufacturing flexible hybrid electronic (FHE) devices. PBDT promises to deliver unprecedented selective, high-fidelity component transfer of a broad range of low-dimensional, high-performance electronic...

Phase 1 STTR

Institution: University of Wisconsin, Madison

Agency: National Science Foundation
Topic: MN
Budget: 07/01/15 - 06/30/16

The broader impact/commercial potential of this Small Business Innovation Research (SBIR) Phase I is the development of a disruptive manufacturing technology that will enable a new class of nanomembrane-based electronic devices to be assembled and integrated on flexible substrates. This innovative technology promises to provide flexible electron...

Phase 2 STTR

Institution: University of Wisconsin, Madison

Agency: Office of the Secretary of Defense
Topic: OSD10-T005
Budget: 07/08/13 - 08/15/14

Flexible electronic and optical devices, including sensors/detectors, waveguides, and photonic crystal structures, have significant promise for improving communication and information processing capabilities in a number of military and commercial applications. However, the development of such flexible devices has been hindered by the lack of eff...

Phase 1 STTR

Institution: University of Wisconsin, Madison

Agency: Office of the Secretary of Defense
Topic: OSD10-T005
Budget: 08/01/11 - 03/01/12

The objective of this phase I STTR project is to develop and demonstrate a roll-to-roll process for printing semiconductor and metal nanostructures with lateral dimensions as small as 100 nm on flexible substrates. systeMech will collaborate with the University of Wisconsin-Madison (Prof. M.G. Lagally s group) to develop and characterize a proc...