Laser Chemical Etching of Longwave Spectrometer Gratings

Period of Performance: 12/13/2002 - 06/15/2003

$69.9K

Phase 1 SBIR

Recipient Firm

LMC Instrument Corp., D/b/a Revise, Inc.
79 Second Ave.
Burlington, MA 01803
Principal Investigator

Abstract

We plan to use Laser Chemical Etching (LCE), a "direct etch process" capable of true high resolution 3-D etching with micron resolution, almost arbitrary depth, and high aspect ratio, to produce convex longwave infrared gratings for use in Offner spectrometers. Laser Chemical Etching (LCE) is vastly superior to Excimer Laser Micromachining in essentially every aspect, from LCE's much higher control, uniformity of etch, and reproducibility to LCE's ultra-clean etching with only gaseous by-products (no derbis). We will demonstrate that laser chemical etching will allow the production of convex longwave infrared gratings without the fabrication limitations of e-beam/optical lithography and without the limitations of ion milling, conventional etching, excimer laser machining, mechanical ruling or conventional replication processes. Laser Chemical Etching will allow the production of convex longwave infrared gratings without the limitations of e-beam/optical lithography and the limitations of ion milling, conventional etching, excimer laser micromachining, mechanical ruling or conventional replication processes.