Inductive Plasma Physical Vapor Deposition for Shape Memory Alloys

Period of Performance: 12/16/1998 - 07/16/1999

$96.8K

Phase 1 SBIR

Recipient Firm

Time Domain CVC
470 Division Street
Campbell, CA 95008
Principal Investigator

Research Topics

Abstract

Thin film deposition of shape memory alloys has heretofore employed physical vapor deposition at low pressures, or thermal plasma sprays employing an arc plasma. We propose to apply inductive plasma spray technology to this application, allowing deposition from the vapor rather than from solid or molten particles (Thermal Plasma Physical Vapor Deposition, TP PVD). This approach will employ simplified methods of supplying precursor material to the torch and avoid problems with powder supply encountered in conventional arc torches. The future application or proprietary technology for non-cylindrical torches will facilitate high-rate deposition on large substrates for commercial and military applications.