Silicone MEMS with Electroless Metals for Tunable RF Filters

Period of Performance: 12/18/1998 - 06/18/1999


Phase 1 SBIR

Recipient Firm

Kionix, Inc.
36 Thornwood Dr.
Ithaca, NY 14850
Principal Investigator

Research Topics


Kionix proposes a Phase I program to study the feasibility of using thick film microelectromechanical systems (MEMS) to create an integrated, scalable, tunable electronic filter. MEMS has been used previously to fabricate variable capacitors. Novel metal deposition processes have been employed to fabricate prototype micro-inductors. However, never have the two disciplines been integrated in a manufacturable process to produce a fully functional filter device. Silicon MEMS will provide the actuating functions to alter the frequency of the tunable filter, while the electroless deposition of thick film metals will provide low loss rf coupling through and between the inductor and capacitor pair. This configuration ensures that the filter operates with low insertion loss, high tuning range, and high isolation to the substrate silicon. BENEFITS: This proposed SBIR program will create a new methodology for tunable filters for application in communications transceivers, in both military and commercial applications.