Massively Parallel Lithography System for Maskless Patterning of Printed Wiring Boards and Digitization of Artwork

Period of Performance: 12/18/1998 - 06/18/1999


Phase 1 SBIR

Recipient Firm

Anvik Corporation
6 Skyline Dr.
Hawthorne, NY 10532
Principal Investigator

Research Topics


In the manufacturing of printed wiring boards (PWB's), lithographic techniques are used to transfer the pattern from a mask onto a single large substrate. The use of masks for lithography inherently results in a number of problems: the inability to generate prototype PWB's quickly; the limited mask life and defect generation when used in contact printers; and the difficulty in storage and archiving of large numbers of masks. It is desirable to maintain a computer data base of PWB mask patterns (open called artwork) which can be used to directly generate printed wiring boards thus eliminating problems associated with contact printing. In the proposed Phase I program, we will develop the capability to pattern directly onto PWB's using a maskless technology while providing the additional capability of digitizing existing patterns on a mylar mask. This additional capability can be achieved by utilizing all of the existing hardware and adding new optical and electronic subsystems which are commercially available off-the-shelf. BENEFITS: The success of the proposed program will have a large impact on the economics of PWB manufacturing. Several advantages are gained Am using the same lithography tool to pattern directly on PWB's as well as reading data from existing artwork: first, costs are reduced since similar hardware is required; second, developing a read system on a manufacturing tool reduces development time; and third, in she process of scanning in the data, it is automatically properly formatted for playback to recreate the pattern.