Large-Area High-Throughput Patterning System with Submicron Resolution

Period of Performance: 06/27/1995 - 10/27/1996

$750K

Phase 2 SBIR

Recipient Firm

Anvik Corporation
6 Skyline Dr.
Hawthorne, NY 10532
Principal Investigator

Research Topics

Abstract

In the manufacturing of flat-panel displays and other devices, the patterning technology employed determines both the device performance and the economics of the manufacturing process. This proposal presents a program for developing a novel patterning system technology that delivers high resolution over a large image field, produces high exposure throughput, and eliminates limitations of existing tools. The new technology has a generic scope, being attractive in the fabrication of flat-panel displays, integrated circuits, and optoelectronic modules. In the proposed Phase II SBIR program, we will design, build and deliver a fully operational prototype system for micron and submicron imaging.