In-Situ X-Ray Detector

Period of Performance: 08/02/1993 - 01/31/1994


Phase 2 SBIR

Recipient Firm

Advanced Technology Materials, Inc.
Danbury, CT 06810
Principal Investigator

Research Topics


In-situ monitoring of critical material properties would greatly enhance process control of numerous manufacturing technologies. ATM, working with Pennsylvania State University, was fully successful in making use of an in-situ x-ray device for eal-time monitoring of chemically vapor deposited metals and oxides. The device, referred to as a position sensitive scintillation detector (PSSD) was modified in Phase I for use in a reactor environment to simultaneously measure critical film parameters such as phase composition, degree of crystallinity, texture, thickness and residual stress. All Phase I objectives were met. Compared to traditional x-ray diffraction systems, the PSSD system was very, very rapid sampling times (7 times faster than traditional systems). In Phase II the angular range and sensitivity of the in-situ PSSD system will be further enhanced to allow for incorporation into commercial scale CVD reactors. Ative feedback loops will be incorporated for process control capability. Vapor-deposited thin films of diamond and metals, critical to MCM technology, will be investigated in a large area CVD reactor. Completion of this effort will result in a prototype commercial detector which ATM will market to the semiconductor industry. ANTICIPATED BENEFITS: A commercial in-situ x-ray diffraction device would be applicable to process monitoring, analysis, and control for numerous manufacturing technologies. Major impacts on quality and yield will lead to rapid industry acceptance of this device in thin film coating, metal forming, ceramic sintering, fiber/composite manufacturing and non-destructive evaluation (NDE) applications.