Advanced Fabrication Methods for High Performance, Uncooled, Thin Film IR Imagi

Period of Performance: 06/30/1993 - 09/22/1995

$497K

Phase 2 SBIR

Recipient Firm

JET Process Corp.
25 Science Park
New Haven, CT 06511
Principal Investigator

Abstract

There is military and commercial demand for new high performance IR detectors and imaging arrays based on materials, such as pyroelectrics, which can operate at ambient temperatures. Pyroelectric thin films are a key detector material needed to enable advanced, low cost, uncooled IR imaging systems. In Phase I Jet Process Corporation (JPS) demonstrated innovative, low cost manufacturing processes, based on our patented, proprietary and environmentaly-clean JET VAPOR DEPOSITION (JVD) technique, for deposition of high quality, submicron pyroelectric thin films. Building on our Phase I success, the goal of our Phase II effort is to develop low-cost jvd processes, and related manufacturing systems for high-quality uncooled pyroelectric thin film detector IR imaging arrays. JVD processes will also be developed for other key electronic imaging device layers such as electrodes, diffusion-barriers, insulators, absorptive layers and passivation coatings. Success will lay the groundwork for Phase III development, manufacture and commercialization of advanced pyroelectric detector arrays monolithically integrated with 'on-chip' readout circuitry.