SBIR Phase I: Hybrid holographic lithography for cost-effective fabrication of nanostructures

Period of Performance: 01/01/2009 - 12/31/2009


Phase 1 SBIR

Recipient Firm

Electrooptic Technologies and Application Systems
4729 Shadwell Place
San Diego, CA 92130
Principal Investigator


This Small Business Innovation Research Phase I project is to demonstrate a novel nanolithography process, i.e. Hybrid Holographic Lithography (HHL) combining interferometric optical lithography with a Spatial Light Modulator (SLM) imaging technique to enable maskless pattern generation. If successful, the new lithographic method will provide a cost effective means of generating nanostructures that can be applied in many fields.