SBIR Phase I: Electrophotographic Patterning of Flexible Backplanes

Period of Performance: 01/01/2003 - 12/31/2003


Phase 1 SBIR

Recipient Firm

Visible Tech-knowledgy
610-612 River Terrace
Hoboken, NJ 07030
Principal Investigator


This Small Business Innovation Research (SBIR) Phase I Project proposes to develop a novel process for manufacturing flexible active matrix backplanes on plastic substrates. The backplane consists of individual amorphous silicon thin-film transistors (TFTs) in a matrix grid pattern fabricated on a thin sheet of plastic. The proposed process will use electrographic printing methods (laser printing) to replace conventional photolithography. The backplanes will be fabricated using techniques such as plasma enhanced chemical vapor deposition and electrophotograhic patterning. The significance of this innovation is that it will reduce the number of processing steps compared to photolithography, lower manufacturing costs, and be compatible with future roll-to-roll manufacturing. The final goal will be to fabricate a working display based on these technologies using a polymer dispersed liquid-crystal medium.