PHOTO CHEMICAL VAPOR DEPOSITION OF BARIUM TITANATE

Period of Performance: 01/01/1993 - 12/31/1993

$50K

Phase 1 SBIR

Recipient Firm

Advanced Technologies/laboratories Intl
Advanced Technologies/Lab Intl, 20010 Century Blvd, Ste 500
Germantown, MD 20874
Principal Investigator

Abstract

FERROELECTRICS SHOW GREAT PROMISE AS ELECTRONIC MATERIALS IN APPLICATIONS RANGING FROM INFRARED DETECTORS TO OPTICAL SWITCHES. BRIUM TITANATE (BATIO3) IS AN ESPECIALLY PROMISING MATERIAL FOR THIN FILM CAPACITOR APPLICATIONS IN ULTRA-LARGE SCALE INTEGRATED CIRCUITS. CONVENTIONAL CHEMICAL VAPOR DEPOSITION (CVD) PROCESSING OF BATIO3 THIN FILMS REQUIRES TEMPERATURES THAT ARE INCOMPATIBLE WITH STANDARD SILICON PROCESSING TECHNOLOGY. PLASMA ENHANCED CVD OF BATIO3 SHOWS SOME POTENTIAL FOR LOWERING TEMPERATURES, BUT IT IS DIFFICULT TO ACHIEVE LARGE-SCALE UNIFORMITY. BOTH THE NON-UNIFORMITY AND TEMPERATURE PROBLEMS MAY BE SOLVED BY THE USE OF A NOVEL PHOTO-ENHANCED CVD PROCESS WHOSE FEASIBILITY WILL BE DETERMINED IN THIS STUDY.