DEVELOPMENT OF HIGH PERFORMANCE MOSI2/SIC LAMINATE COMPOSITES

Period of Performance: 01/01/1989 - 12/31/1989

$49.9K

Phase 1 SBIR

Recipient Firm

Materials Technologies Corp.
57 MARYANNE DRIVE
Monroe, CT 06468
Principal Investigator

Abstract

THE MAIN OBJECTIVE OF THIS PROJECT IS TO DEVELOP THE TECHNOLOGY FOR FABRICATING HIGH TEMPERATURE, HIGH OXIDATION RESISTANT MOSI2/SIC LAMINATED COMPOSITE STRUCTURES VIA A SCALABLE AND COST-EFFECTIVE CHEMICAL VAPOR DEPOSITION (CVD) PROCESS. IN PHASE I, THE CHEMICAL COMPATIBILITY BETWEEN SIC AND MOSI2 WILL BE DETERMINED AT TEMPERATURES UP TO 1,650 DEGREES CENTIGRADE. FEASIBILITY OF FABRICATING THE LAMINATED STRUCTURE OF THE COMPOSITE WILL THEN BE ESTABLISHED. SMALL SAMPLES OF THE COMPOSITE WILL BE FABRICATED BY DEPOSITING ALTERNATE LAYERS OF SIC AND MOSI2 SO THAT LARGE COMPRESSIVE STRESSES ARE PRODUCED ON THE COMPOSITE SURFACE. THE COMPOSITE MATERIAL WILL BE CHARACTERIZED FOR IMPORTANT PROPERTIES SUCH AS DENSITY, HARDNESS, FLEXURAL STRENGTH, FRACTURE TOUGHNESS, AND THERMALEXPANSION COEFFICIENT.