Innovative, High-Throughput, Large-Area, Versatile Nanoimprint Tools

Period of Performance: 10/31/2001 - 06/30/2002


Phase 1 SBIR

Recipient Firm

Nanonex Corp.
1 Deer Park Drive Suite O
Monmouth Junction, NJ 08852
Principal Investigator


Based on the previous extensive work on NIL in Prof. Chou's group and at Nanonex Corporation, the objective of the project is to further develop a promising innovative nanoimprint lithography (NIL) machine design. The design, using a new principle, offers not only excellent uniformity of nanostructures over large areas, high-throughput (