Diamondlike Atomic-Scale Composite Protective Coatings for Plasma and Microwave Devices

Period of Performance: 06/13/1994 - 06/13/1996

$621K

Phase 2 SBIR

Recipient Firm

Advanced Refractory Technologies, Inc.
699 Hertel Ave., Suite 290
Buffalo, NY 14207
Principal Investigator

Research Topics

Abstract

Phase I research has shown that diamond-like Nanocomposite (DLN) thin films possess high dielectric breakdown strength and flashover holdoff, excellent plasma ablation resistance, and good thermal stability. Adherent films can be deposited on a variety of substrates, including teflon, HDPE, polyurenthane, steel, and aluminum. The feasibility of protecting insulators used in plasma devices with DLN in order to enhance performance has thus been demonstrated. On the strength of demonstrated properties, ART has put together a vertically integrated team for the Phase II effort. The proposed effort will involve investigation of breakdown mechanisms, technology development including improvement of productivity, performance testing under actual use conditions in comparison with existing alternative materials, and focused optimization for specific technical requirements. Significant cost sharing is included both by ART and by subcontractors. The results of the proposed work are likely to not only have significant impact in addressing problems being faced in the pulse power field, but also in taking the DLN deposition technology to a stage where other application areas can also benefit from productivity improvements. The likelihood of success is high due to demonstrated properties, as well as the involvement of recognized and experienced teams in each of the major areas of planned research.